培训协助营运主管对终端人员开展培训工作提升终端运营管理水平.doc
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1、. .Modelling, simulation, and visualisation together create the third branch of human knowledge on equal footing with theory and experiment. Model-Driven Development (MDD) has been proposed as a means to support the software development process through the use of a model-centric approach. The object
2、ive of this paper is to address the design of an architecture for scientific application that may execute as multithreaded putations, as well as implementations of the related shared data structures. New version program summaryProgram title: Growth09 Catalogue identifier: ADVL_v3_0 Program summary U
3、RL: cpc.cs.qub.ac.uk/summaries/ADVL_v3_0.html Program obtainable from: CPC Program Library, Queens University, Belfast, N. Ireland Licensing provisions: Standard CPC licence, cpc.cs.qub.ac.uk/licence/licence.html No. of lines in distributed program, including test data, etc.: 30940 No. of bytes in d
4、istributed program, including test data, etc.: 3119488 Distribution format: tar.gz Programming language: Embarcadero Delphi puter: Intel Core Duo-based PC Operating system: Windows XP, Vista, 7 RAM: more than 1 GB Classification: 4.3, 7.2, 6.2, 8, 14 Catalogue identifier of previous version: ADVL_v2
5、_1 Journal reference of previous version: put. Phys. m. 180 (2021) 1219 Subprograms used:Does the new version supersede the previous version?: No Nature of problem: Molecular beam epitaxy (MBE) is a technique for epitaxial growth via the interaction of one or several molecular or atomic beams that o
6、ccurs on a surface of a heated crystalline substrate. Reflection high-energy electron diffraction (RHEED) is an important in situ analysis technique, which is capable of giving quantitative information about the growth process of thin films and its control. The analysis of RHEED intensity oscillatio
7、ns has two purposes. One is to control the film growth, and the other is to understand the mechanism of the film growth using the MBE through the analysis of surface morphology as a function of time. Such control allows the development of structures where the electrons can be confined in space, givi
8、ng quantum wells or even quantum dots. Such layers are now a critical part of 3 many modern semiconductor devices, semiconductor lasers, light-emitting diodes and new devices for the magnetic storage industry. Solution method: The present paper reports a practical and pragmatic approach for MDD tech
9、nology 1 that has been used during design of the Growth09 program. Growth09 is a numerical model that uses multithreaded and partially nested transactions for simulation of epitaxial growth of thin films. Reasons for new version: Responding to user feedback the program has been upgraded to a standar
10、d that allows a slave process, carrying out putations of the RHEED intensities for a disordered surface, to be run. Also, functionality and documentation of the program have been improved. Summary of revisions:1. The MDD technology has been used to design a puter model that allows the user to carry
11、out numerical calculations layers coverage during the growth of thin epitaxial films, surface roughness, and the RHEED intensities for a disordered surface. This puter model can be applied to interpret the experimental data in real time 2. 2. The logical structure of the Platform-Specific Model of t
12、he Growth06_v2 program has been modified according to the scheme shown in Fig. 1*. The class diagram in Fig. 1* is a static view of the main platform-specific elements of the Growth09 application architecture. Fig. 2* provides a dynamic view by showing the creation and destruction simplistic sequenc
13、e diagram. Fig. 3* presents the Growth09 use case model. 3. As can be seen in Fig. 1, Fig. 2 and Fig. 3* the Growth09 has been designed as a master program for the slave RHEED1DProcess (see A. Daniluk, Model-Driven Development for scientific puting. putations of RHEED intensities for a disordered su
14、rface. Part I). 4. The slave RHEED1DProcess can be run as separate thread of the Growth09. Fig. 4* depicts the Platform-Specific Model for the development elements of the new distribution. *The figures mentioned can be downloaded, see “Supplementary material below. Unusual features: The program is d
15、istributed in the form of main project Growth09.dproj, with associated files, and should be piled using Embarcadero RAD Studio 2021 along with Together visual modelling platform. The program should be piled with English/USA regional and language options. Additional ments: This version of the GROWTH
16、program is designed to run in conjunction with the RHEED1DProcess (ADUY_v4_0) program. It does not replace the previous, stand alone, GROWTH06-v2 (ADVL_v2_1) version. Running time: The typical running time is machine and user-parameters dependent. References:1 OMG, Model Driven Architecture Guide Ve
17、rsion 1.0.1, 2003. 2 P. Mazurek, A. Daniluk, K. Paprocki, Vacuum 72 (4) (2004) 363.Article OutlineSupplementary materialSupplementary materialPurchase$ 31.5020Multithreaded transactions in scientific puting: New versions of a puter program for kinematical calculations of RHEED intensity oscillations
18、Original Research Articleputer Physics munications, Volume 175, Issue 10, 15 November 2006, Pages 678-681Marcin Brzuszek, Andrzej DanilukClose preview| Related articles|Related reference work articles AbstractAbstract | ReferencesReferencesAbstractWriting a concurrent program can be more difficult t
19、han writing a sequential program. Programmer needs to think about synchronisation, race conditions and shared variables. Transactions help reduce the inconvenience of using threads. A transaction is an abstraction, which allows programmers to group a sequence of actions on the program into a logical
20、, higher-level putation unit. This paper presents multithreaded versions of the GROWTH program, which allow to calculate the layer coverages during the growth of thin epitaxial films and the corresponding RHEED intensities according to the kinematical approximation. The presented programs also conta
21、in graphical user interfaces, which enable displaying program data at run-time. New version program summaryTitles of programs:GROWTHGr, GROWTH06 Catalogue identifier:ADVL_v2_0 Program summary URL: cpc.cs.qub.ac.uk/summaries/ADVL_v2_0 Program obtainable from:CPC Program Library, Queens University of
22、Belfast, N. Ireland Catalogue identifier of previous version:ADVL Does the new version supersede the original program:No puter for which the new version is designed and others on which it has been tested: Pentium-based PC Operating systems or monitors under which the new version has been tested: Win
23、dows 9x, XP, NT Programming language used:Object Pascal Memory required to execute with typical data:More than 1 MB Number of bits in a word:64 bits Number of processors used:1 No. of lines in distributed program, including test data, etc.:20931 Number of bytes in distributed program, including test
24、 data, etc.: 1311268 Distribution format:tar.gz Nature of physical problem: The programs pute the RHEED intensities during the growth of thin epitaxial structures prepared using the molecular beam epitaxy (MBE). The putations are based on the use of kinematical diffraction theory P.I. Cohen, G.S. Pe
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