半导体行业对外测试设备介绍精.docx

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1、SSM 2000 SRP介绍The spreading resistance technique is a method for measuring the electrical properties of semiconductor materials with very high spatial resolution; it is based on measurements of the contact resistance of specially prepared point contacts on doped silicon samples. The SSM 2000 NANOSRP

2、 System is an automated spreading resistance probe designed to characterize the electrical properties of doped silicon materials. This system generates profiles of resistivity, carrier density, and electrically active dopant density more quickly and more easily than its predecessor, the SSM 150. It

3、is the most advanced SRP test machine in world.Silan characteristic1、 Can afford the best accuracy result for custom.2、 We have the unique ability to test the Ultrashallow layer. Example we can test implant resistivity profiler on surface. We can guarantee 6nm resolution for test Ultrashallow layer.

4、3、Can measure the resistivity of patterned samples (dimension of pattern above 80um) .扩展电阻率测试是用高分辨率测试半导体材料的电特性。它基于被测样片上接触的探针来测试。SSM 2000 是一台自动的用扩展电阻的方法来反应参杂硅材料电特性的机器。它能产生整个硅片电阻率的轮廓特性，载流子浓度，参杂浓度。 它比国内常用的SSM 150要快速，准确许多。是目前世界最先进的SRP测试设备之一。士兰特点：1、能给用户提供国内最精确的测试结果。2、是国内唯一有能力准确测试浅层结构，如注入表层电阻率的变化特性。能保证6nm

5、的分辨率准确性。3、能测试图形中样品的扩展电阻率（图形尺寸80um以上）。SSM495 C-V测试仪The SSM495 is an automatic mercury probe capacitance-voltage (CV) measuring system. The SSM 495 has an advanced measurement tool with many characteristics such as good spatial resolution, good sensitivity and non-destructive. The resistivity of all k

6、inds epi samples can be accurately measured using SSM 495. The measurement range is from 0.1 to 100.cm in n-type wafer; from 0.24 to 330 .cm in P-type wafers. The SSM495 can also be used to monitor oxide quality (Threshold voltage: Vth;Flat band voltage: Vfb; Oxide capacitance: Cox; Effective oxide

7、charge: Neff ). In addition, it can offer good resolution in monitoring the implant dose of B, P or As in the channel region under the gate.SILAN CharacteristicWe can test most of P type EPI wafer which is very hard for many companies sometimes.SSM495全自动汞探针CV测试系统是先进的测试工具，具有空间分辨率高、灵敏度好、非破坏性等特点。它能精确地测

8、试各种外延片的电阻率。N型硅片的测试范围为：0.1100.cm；P型硅片的测试范围为：0.24330.cm。SSM495亦可用于监测氧化层质量（阀值电压Vth；平带电压Vfb；氧化层电容Cox; 氧化层电荷数Neff）。此外，对于栅极下面沟道区的B、P、As注入剂量，SSM495能提供完美的监测方案。士兰特点：对于P型外延片电阻率的测试一般公司很难有能力测试，有的甚至放弃测试P型外延片，而我们能测试大部分的P型片。QS FTIR系列介绍QS FTIR series is an advanced FT-IR tool developed by Bio-Rad laboratories, Inc.

9、 It has strong functions which are widely used in analysis of PSG films, BPSG films, silicon nitride films, epi layers and bare wafers. The concentration of B and P in BPSG films can be measured using PCR or PLS techniques contained in QS M-408,and it can analyze Hydrogen in silicon nitride films, o

10、xygen and carbon in silicon, also measure Epitaxial thickness.SILAN Characteristic1、 We own the Bio-Rad QS series FTIR machines which is the famous FTIR in world. Including several QS300, QS408, QS500 etc. models.2、We can afford the rapid and accuracy result by our experience and theory.QS FTIR 系列是台

11、由Bio-Rad实验室有限公司制造的FT-IR测试工具。其功能强大，广泛应用于分析PSG薄膜、BPSG薄膜、 Si3N4薄膜、外延层和硅片。 QS FTIR提供的PCR和PLS技术可用于测试BPSG薄膜中的B、P含量。此外，QS FTIR还可用于测试Si3N4薄膜中的氢含量，硅中的碳、氧含量以及外延层的厚度。士兰特点：1、拥有FTIR业界标准的BIO-RAD QS系列产品，包括多台QS 300，QS408，QS500等各类型号。2、丰富的理论与实践能力保证了测试的快速，准确性。是国内用FTIR应用最广泛的公司之一。Opti-Probe 介绍The Opti-Probe is a powerfu

12、l film thickness measurement tool that can measure most films and film stacks with high precision and repeatability, such as t, n, and k. It performs this function by integrating three film thickness measurement techniques: Beam Pro, Visible Spectrometry, Beam Pro.On fully equipped systems, the Opti

13、-Probe can utilize all three technologies to obtainrobust, repeatable measurement results.A thin standard should measure within 1 of a wafers known value.A thick standard should measure within 2 of a wafers known value.SILAN Characteristic :1. The testing application engineer with perfect experience

14、 can provide all kinds of complex test project.2. The advanced equipment performance and top-ranking technology team in China farthest assure the results accurate.OPTI-PROBE设备能够测试各种膜质和膜层的膜厚，折射率，消光系数，具有很高的精确性和重复性。OPTI-BPROBE是通过三种目前世界上最先进的膜厚测试技术来保证准确性：BPR（Beam Pro）、BPE（Beam Pro）、VS（Visible Spectrometr

15、y）。在整个系统中，OPTI-PROBE可以综合利用上面三种技术获得稳定的测试结果，对于薄的膜层测试精度1 ，对于厚的膜层测试精度2 士兰特点：1.具有丰富的经验的测试应用工程师能提供各类复杂测试的解决方案。 2.先进的设备性能以及国内一流的技术团队能最大程度地保证测试结果准确性。ADE 9500介绍ADEs UltraGage 9500 has become the industry standard for wafer geometry characterization for both device fabs and silicon wafer manufactures. The sma

16、ll footprint, noncontact measurements and automated operation combined with 10 nm resolution position the UltraGage as the ideal process development, analysis and control tool for photolithography, thin film stress, thermal, CMP and backgrind processes.Measurements: Thickness,Flatness(Global&Site),S

17、hape(Bow/Warp)Features:Non-contact measurements,10nm resolution, Patterned or polished wafers, Integral prealignment, Manual or cassette operationAccuracy: Thickness(0.5m),flatness（0.15m），Bow and Warp（3.0m+5% of reading）SILAN CharacteristicWe can afford the best test result of accuracy by the severe

18、st calibration method and our perfectly technology. ADE公司生产的UltraGage 9500已经成为硅片制造商和集成电路制造商用来表征硅片几何尺寸的工业标准。其测试具有非接触、全自动等特点，分辨率为10 nm。UltraGage 9500是光刻，薄膜，热处理，CMP以及减薄等工艺的开发、分析和控制的理想工具。测试内容：厚度，平坦度（点测试或整个硅片测试），形貌（弯曲度和翘曲度）测试特点：非接触，10nm分辨率，有图形片或者抛光片，预对准，手动或者自动测试测试精度：厚度（0.5m）；平坦度（0.15m）；弯曲度和翘曲度（3.0m+读数的5%）士兰特点：使用严格的校正手段和技术能力来最大程度地保证测试的准确性。