最新微图形转移技术——光刻PPT课件.ppt

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1、微图形转移技术微图形转移技术光刻光刻微型机电系统课程系列之三Institute of Precision Engineering,XJTU微型机电系统课程系列之三Institute of Precision Engineering,XJTU光源光阑快门掩模光刻胶层微型机电系统课程系列之三Institute of Precision Engineering,XJTU微型机电系统课程系列之三Institute of Precision Engineering,XJTU微型机电系统课程系列之三Institute of Precision Engineering,XJTU微型机电系统课程系列之三Ins

2、titute of Precision Engineering,XJTU微型机电系统课程系列之三Institute of Precision Engineering,XJTUParallel lightMaskPhotoresistParallel lightMaskPhotoresistContact Exposure ModesSoft contact(adjustable mechanical pressure)Hard contact(additional nitrogen pressure)Vacuum contact(evacuation of exposure gap)Soft

3、vacuum(vacuum contact with additional nitrogen pressure)Mechanical pressureN2Mechanical pressureVacVacMechanical pressureMaskChuckMechanical pressureVacN2西安交通大学精密工程研究所西安交通大学精密工程研究所 Institute of Precision Engineering,Xian Jiaotong UniversityInstitute of Precision Engineering,Xian Jiaotong University微

4、型机电系统课程系列之三微型机电系统课程系列之三Institute of Precision Engineering,XJTU微型机电系统课程系列之三Institute of Precision Engineering,XJTU微型机电系统课程系列之三Institute of Precision Engineering,XJTU微型机电系统课程系列之三Institute of Precision Engineering,XJTU微型机电系统课程系列之三Institute of Precision Engineering,XJTU1 1Basic of PhotolithographyBasic

5、of Photolithography2 2Mask FabricationMask Fabrication3 3Mask AlignerMask Aligner4 4Photolithography ProcessPhotolithography Process5 5Results JudgementResults Judgement微型机电系统课程系列之三Institute of Precision Engineering,XJTU基底清洗匀胶前烘曝光显影后烘烘干中烘漂洗微型机电系统课程系列之三Institute of Precision Engineering,XJTU西安交通大学精密工

6、程研究所西安交通大学精密工程研究所 Institute of Precision Engineering,Xian Jiaotong UniversityInstitute of Precision Engineering,Xian Jiaotong University微型机电系统课程系列之三010203040506005001000150020002500Speed(rpm)Resist Thickness(m)Medium Thicknesses of AZ4562:30 s Spin TimeResults for polished silicon,thickness depends

7、on ambient humidityand surface preparation 西安交通大学精密工程研究所西安交通大学精密工程研究所 Institute of Precision Engineering,Xian Jiaotong UniversityInstitute of Precision Engineering,Xian Jiaotong University微型机电系统课程系列之三Very Thick Layers of AZ4562 in One Step:Acceleration 1 000 rpm/s020406080100120051015202530Spin Time

8、(s)Resist Thickness(m)300 rpm400 rpm500 rpm 西安交通大学精密工程研究所西安交通大学精密工程研究所 Institute of Precision Engineering,Xian Jiaotong UniversityInstitute of Precision Engineering,Xian Jiaotong University微型机电系统课程系列之三微型机电系统课程系列之三Institute of Precision Engineering,XJTU1 1Basic of PhotolithographyBasic of Photolithog

9、raphy2 2Mask FabricationMask Fabrication3 3Mask AlignerMask Aligner4 4Photolithography ProcessPhotolithography Process5 5Result JudgementResult Judgement微型机电系统课程系列之三Institute of Precision Engineering,XJTU微型机电系统课程系列之三Institute of Precision Engineering,XJTUDose:HighDeveloper:LowDose:LowDeveloper:HighDose:MediumDeveloper:ModeratePRSubstrate微型机电系统课程系列之三Institute of Precision Engineering,XJTUThank you.