数字集成电路分析与设计 (11).ppt
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1、The Wire2The Wire1.Introduction2.Capacitance3.Resistance4.Electrical Wire Models5.Summary6.Textbook ReferenceChapter Outline31.Introduction:Three Major Interconnection LayersThree Major Interconnection LayersLayers used to realize interconnection in state-of the-art MOS ICUpper layer:multiple layers
2、 of aluminum or copperMiddle layer:at least one layer of polysiliconLower layer:heavily doped n+or p+diffusion layer,which is typically used for the realization of source and drain regions.The Wire41.Introduction:Wire Examples0.35 um High End Microprocessor0.1 um High End MicroprocessorThe Wire51.In
3、troduction:The WireSchematic ViewPhysical viewTransmittersReceiverThese wires belong to the same layerSchematic and physical views of wiring of bus networkThe Wire61.Introduction:Wire ModelsAll-inclusive ModelCapacitance only models Wire models for the circuit of previous foilThe Wire71.Introduction
4、:Interconnect ParasiticsInterconnect parasiticsCause an increase in propagation delay,or,equivalently,a drop in performanceHave an impact on the energy dissipation and the power distributionCause the introduction of extra noise sources,which affect the reliability of the circuitClasses of parasitics
5、CapacitiveResistiveInductiveThe Wire8Chapter Outline1.Introduction2.Capacitance3.Resistance4.Electrical Wire Models5.Summary6.Textbook ReferenceThe Wire9VDDVinVoutM1VDDVout2M2M3M4Cdb2Cdb1Cgd12CwCg3Cg4CL Parasitic capacitance CL of the cascaded inverter pairInterconnect2.Capacitance:Capacitance of Wi
6、re InterconnectCapacitance of Wire InterconnectSimplified ModelDriverFan-outThe Wire10 Parallel-plate(W tox)toxHLWSiO2substrateElectric fieldW、tox1/S Scaling behaviorL 1/SL2.Capacitance:Capacitance Model Current flowParallel-plate capacitance model of interconnect wire Exploiting parallel-plate Cap.
7、model,the wire Cap.can be expressed as:u tox and eox stand for the thickness and permitivity of the dielectric layer.The Wire11 Permittivity:e eox=e ere e02.Capacitance:Capacitance Model The Wire12Intel 0.25um interconnect With device dimensions scaling downTo minimize the resistance of the wires,it
8、 is desirable to keep the cross section(W x H)of the wire as large as possibleSmall value of W leads to denser wiring and less area overheadWitnessing a steady reduction in the W/H ratio(even below unity)Fringing Cap.FringingP-PFringingP-PFringingInter-wireP-P2.Capacitance:Fringing CapacitanceThe Wi
9、re132.Capacitance:Fringing CapacitanceIntel 0.18um interconnectH WThe Wire14(a)Fringing fields(b)Model of fringing-field capacitance This model decomposes the Cap.into two parts:parallel-plate Cap.and fringing Cap.Caps.of interconnect wire as a function of W/tdi,including fringing-field effects.Ctot
10、al2.Capacitance:Fringing CapacitanceThe WireCparallel-plate152.Capacitance:Wiring Capacitances(0.25 mm CMOS)Wiring Capacitances(0.25 mm CMOS)FieldActivePolyAL1AL2AL3AL4AL5Poly8854AL1304157404754AL21315173625272945AL38.99.41015411819202749AL46.56.87.08.91535141515182745AL55.25.45.46.69.11438121212141
11、92752Red:upper layerBlue:Lower layerShadowless:P-P Cap.(aF/um2)Shadowed :fringing Cap.(aF/um)both sides should be consideredThe Wire162.Capacitance:Example of Wire Capacitance CalculationExample of Wire Capacitance CalculationlExample:Aluminum wire with L10cm,W1um,calculate its total capacitance.P-P
12、 Cap.:Fringing Cap.:Total Cap.:C groundThe Wire17LayerCap.FringingInterwireP-PGround 2.Capacitance:Interwire CapacitanceInter wire Cap.(Unit:aF/um)Capacitive coupling between wiresW/HThe Wire18Example:Aluminum wire with L10cm,W1um,calculate its total capacitance.2.Capacitance:Example of Wire Capacit
13、ance CalculationExample of Wire Capacitance CalculationP-P Cap.:Fringing Cap.:Total Cap.:The interwire Cap.(9.5pF)is almost as large as the total Cap.to ground.Interwire Cap.:Suppose that a second wire is routed along side the first one,separated by only the minimum allowed distance,calculate the in
14、terwire capacitance.C groundC adjacentThe Wire192.Capacitance:Total Capacitance Multi-Layer Cap.ModelUpper bound of total Cap.The WireCgnd=Cbot+CtopCtotal=Cgnd+2Cadj=Cbot+Ctop+2Cadj20Chapter Outline1.Introduction2.Capacitance3.Resistance4.Electrical Wire Models5.Summary6.Textbook ReferenceThe Wire21
15、3.Resistance:Resistivity and Sheet ResistanceResistivity and Sheet Resistance Model of wire resistanceWHL Sheet resistance:R(H is a constant for a given tech):Unit:/Resistivity of commonly used conductors(at 20 oC)Resistance of a wireCurrentLWLW CurrentThe Wire223.Resistance:Modern InterconnectModer
16、n InterconnectMicrophotograph of interconnect after removal of insulatorThe Wire233.Resistance:Resistivity and Sheet ResistanceResistivity and Sheet ResistanceSheet ResistanceThe Wire24 Polycide Gate MOSFETn+n+SiO2PolySiliconSilicidepSilicides:WSi2,TiSi2,PtSi2 and TaSiConductivity:8-10 times better
17、than PolySilicon3.Resistance:Dealing with ResistanceThe Wire253.Resistance:Resistivity and Sheet ResistanceResistivity and Sheet ResistanceSheet ResistanceThe Wire26Selective Technology ScalingScaling down W and L,but keep H a constantMore Interconnect Layersreduce average wire-lengthUse Better Inte
18、rconnect Materialse.g.copper,silicides3.Resistance:Dealing with ResistanceThe Wire27Chapter Outline1.Introduction2.Capacitance3.Resistance4.Electrical Wire Models5.Summary6.Textbook ReferenceThe Wire284.Electrical Wire Model:IntroductionThe Ideal WireLumped Model Lumped C Model Lumped RC ModelDistri
19、buted rc-LineTransmission LineWires occur as simple lines with no attached parameters or parasiticsThe Wire29 When only a single parasitic component is dominant,or when the interaction between the components is small,or when looking at only one aspect of the circuit behavior,it is often useful to lu
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